Keshav Sewraj, Matthys M. Botha, Stellenbosch University, South Africa
Si-Yi Yang, Li Xu, Bing-Qi Liu, Zhong-Hai Yang, Bin Li, University of Electronic Science and Technology of China, China
Amedeo Capozzoli, Claudio Curcio, Angelo Liseno, Università di Napoli Federico II, Italy
Arjun Gupta, Christos Christodoulou, Manel Mart´ınez-Ramo´n, University of New Mexico, United States; Jose Luis Rojo Alvarez, Universidad Rey Juan Carlos, Spain
Yang Hong, Yan-He Lv, Hai-Ying Luo, Wei Shao, University of Electronic Science and Technology of China, China; ,
Hai-Ying Luo, Yang Hong, Yan-He Lv, Wei Shao, University of Electronic Science and Technology of China, China
Wen Luo, Jinbo Liu, Zengrui Li, Communication University of China, China; Jiming Song, Iowa State University, United States
Han Wang, State Key Laboratory of CAD&CG, China; Nan Wu, Key Laboratory of Electromagnetic Compatibility, China; Hai Lin, State Key Laboratory of CAD&CG, China
